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XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

dc.contributor.authorVaschenko, G. O., author
dc.contributor.authorGrisham, M. E., author
dc.contributor.authorMenoni, C. S., author
dc.contributor.authorRocca, Jorge, J., author
dc.contributor.authorRyc, L., author
dc.contributor.authorFeldhaus, J., author
dc.contributor.authorBoody, F. P., author
dc.contributor.authorSobierajski, R., author
dc.contributor.authorPelka, J. B., author
dc.contributor.authorAndrejczuk, A., author
dc.contributor.authorKrzywinski, J., author
dc.contributor.authorStupka, M., author
dc.contributor.authorRus, B., author
dc.contributor.authorPräg, A. R., author
dc.contributor.authorPolan, J., author
dc.contributor.authorKozlova, M., author
dc.contributor.authorOtcenasek, Z., author
dc.contributor.authorKrasa, J., author
dc.contributor.authorLetal, V., author
dc.contributor.authorChvostova, D., author
dc.contributor.authorBittner, M., author
dc.contributor.authorJuha, L., author
dc.contributor.authorElsevier B. V., publisher
dc.date.accessioned2007-01-03T08:10:18Z
dc.date.available2007-01-03T08:10:18Z
dc.date.issued2005
dc.description.abstractFor conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, etch (ablation) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various very short-wavelength (λ < 100 nm) lasers, emitting pulses with durations ranging from ∼10 fs to ∼1 ns, have recently been placed into routine operation. This has facilitated the investigation of how ablation characteristics depend on the pulse duration in the XUV spectral region. Ablation of poly(methyl methacrylate) (PMMA) induced by three particular short-wavelength lasers emitting pulses of various durations, is reported in this contribution.
dc.format.mediumborn digital
dc.format.mediumarticles
dc.identifier.bibliographicCitationJuha, L., et al., XUV-Laser Induced Ablation of PMMA with Nano-, Pico-, and Femtosecond Pulses, Journal of Electron Spectroscopy and Related Phenomena 144-147 (June 2005): [929]-932.
dc.identifier.urihttp://hdl.handle.net/10217/67843
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado State University. Libraries
dc.relation.ispartofFaculty Publications
dc.rights©2005 Elsevier B. V.
dc.rightsCopyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.
dc.subjectwavelength effects
dc.subjectPMMA
dc.subjectpoly(methyl methacrylate)
dc.subjectpulse duration effects
dc.subjectablation
dc.subjectsoft X-ray lasers
dc.subjectXUV lasers
dc.titleXUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses
dc.typeText

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