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XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses

Date

2005

Authors

Vaschenko, G. O., author
Grisham, M. E., author
Menoni, C. S., author
Rocca, Jorge, J., author
Ryc, L., author
Feldhaus, J., author
Boody, F. P., author
Sobierajski, R., author
Pelka, J. B., author
Andrejczuk, A., author

Journal Title

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Abstract

For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, etch (ablation) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various very short-wavelength (λ < 100 nm) lasers, emitting pulses with durations ranging from ∼10 fs to ∼1 ns, have recently been placed into routine operation. This has facilitated the investigation of how ablation characteristics depend on the pulse duration in the XUV spectral region. Ablation of poly(methyl methacrylate) (PMMA) induced by three particular short-wavelength lasers emitting pulses of various durations, is reported in this contribution.

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Subject

wavelength effects
PMMA
poly(methyl methacrylate)
pulse duration effects
ablation
soft X-ray lasers
XUV lasers

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