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Refraction effects on x-ray and ultraviolet interferometric probing of laser-produced plasmas

Date

2003

Authors

Marconi, Mario C., author
Filevich, Jorge, author
Rocca, Jorge J., author
Shlyaptsev, Vyacheslav N., author
Hunter, James R., author
Nilsen, Joseph, author
Dunn, James, author
Smith, Raymond F., author
Optical Society of America, publisher

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Abstract

We present a study detailing the effects of refraction on the analysis and interpretation of line-of-site optical probe characterization techniques within laser-produced plasmas. Results using x-ray laser backlit grid deflectometry and ray-tracing simulations illustrate the extent to which refraction can be a limiting factor in diagnosing high-density, short-scale-length plasmas. Analysis is applied to a recent experiment in which soft x-ray interferometry was used to measure the electron density within a fast-evolving Al plasma. Comparisons are drawn between extreme ultraviolet and ultraviolet probe wavelengths.

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