The prospects of reflectometry and ellipsometry with Colorado State University tabletop XUV laser
Date
2001
Authors
Lebedev, P. N., author
Yamamoto, M., author
Vinogradov, A. V., author
Seminario, M., author
Rocca, Jorge J., author
Fechtchenko, R. M., author
Benware, B. R., author
Artioukov, I. A., author
EDP Sciences, publisher
Journal Title
Journal ISSN
Volume Title
Abstract
The capillary discharge ArIX laser (wavelength 46.9nm) is a new device attractive for various applications due to its unique for XUV lasers properties: high average power and compactness. Reflectometry and ellipsometry are among them. The first is capable to provide fundamental data on optical constants of solids, which are still rather limited. Reflection coefficient in this spectral range is highly sensitive to the presence of an over layer at the surface of a sample. This hinders bulk optical constants determination, but offers the possibility to study chemical contamination by ambience. The theory of reflection from a surface with a thin overlayer is developed. It enables to rigorously include overlayer into reflectometry data processing and derive separately the parameters of bulk and overlayer. Ellipsometry in general is more powerful than reflectometry method to measure optical constants. In addition it offers the accurate methods to measure film thickness and properties of magnetic materials. Unfortunately high quality analyzers and polarizers are not available in this spectral range, which requires specific approach to ellipsometric measurements. We discuss and use for this purpose Sc/Si multilayer structures.