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A review of microelectronic film deposition using direct and remote electron-beam-generated plasmas

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dc.contributor.authorCollins, George J., author
dc.contributor.authorLin, Chongjie, author
dc.contributor.authorZarnani, Hamid, author
dc.contributor.authorSheng, Tien Yu, author
dc.contributor.authorLuo, Zongnan, author
dc.contributor.authorZu, Zengqi, author
dc.contributor.authorIEEE, publisher
dc.date.accessioned2007-01-03T07:27:54Z
dc.date.available2007-01-03T07:27:54Z
dc.date.issued1990
dc.description.abstractSoft-vacuum-generated electron beams employed to create a large area plasma for assisting chemical vapor deposition (CVD) of thin films are reviewed. The electron beam plasma is used both directly, where electron impact dissociation of feedstock gases plays a dominant role, and indirectly in a downstream afterglow, where electron impact dissociation of feedstock reactants plays no role. Rather, photodissociation and metastable atom-molecule reactions dominate in the downstream afterglow. To better understand electron-beam-created plasmas using a slotted ring cathode, the transmitted beam spatial intensity profiles have been quantified from initial generation at a slotted line-shaped cold cathode through acceleration in the cathode sheath and propagation in the ambient gas. To better understand the role of photodissociation in downstream plasma-assisted CVD, the VUV output spectrum and VUV generation efficiency from electron-beam-excited plasmas have been measured. The properties of films deposited via both direct electron-beam-generated plasma-assisted CVD and downstream afterglow CVD are reviewed and compared to conventional plasma assisted CVD films.
dc.description.sponsorshipThis work was supported in part by the Naval Research Laboratory, the National Science Foundation, Emerging Technology Division NSF Grant EET8806851, Solid State and Microstructures, NSF Grant ECS-8906311, and the ORC Manufacturing Company, Ltd.
dc.format.mediumborn digital
dc.format.mediumarticles
dc.identifier.bibliographicCitationYu, Zengqi, et al., A Review of Microelectronic Film Deposition Using Direct and Remote Electron-Beam-Generated Plasmas, IEEE Transactions on Plasma Science 18, no. 5 (October 1990): 753-765.
dc.identifier.urihttp://hdl.handle.net/10217/629
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado State University. Libraries
dc.relation.ispartofFaculty Publications
dc.rights©1990 IEEE.
dc.rightsCopyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.
dc.subjectelectron beam effects
dc.subjectplasma CVD
dc.subjectplasma CVD coatings
dc.subjectreviews
dc.subjectplasma-beam interactions
dc.titleA review of microelectronic film deposition using direct and remote electron-beam-generated plasmas
dc.typeText

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