Table top nanopatterning with extreme ultraviolet laser illumination
| dc.contributor.author | Attwood, D. T., author | |
| dc.contributor.author | Chao, W., author | |
| dc.contributor.author | Anderson, E. H., author | |
| dc.contributor.author | Iemmi, C., author | |
| dc.contributor.author | Rocca, J. J., author | |
| dc.contributor.author | Menoni, C. S., author | |
| dc.contributor.author | Patel, D., author | |
| dc.contributor.author | Marconi, Mario Carlo, author | |
| dc.contributor.author | Wachulak, P., author | |
| dc.contributor.author | Capeluto, M. G., author | |
| dc.contributor.author | Elsevier B. V., publisher | |
| dc.date.accessioned | 2007-01-03T08:10:19Z | |
| dc.date.available | 2007-01-03T08:10:19Z | |
| dc.date.issued | 2007 | |
| dc.description.abstract | Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications. | |
| dc.format.medium | born digital | |
| dc.format.medium | articles | |
| dc.identifier.bibliographicCitation | Capeluto, M. G., et al., Table Top Nanopatterning with Extreme Ultraviolet Laser Illumination, Microelectronic Engineering 84, no. 5-8 (May-August 2007): [721]-724. | |
| dc.identifier.uri | http://hdl.handle.net/10217/67860 | |
| dc.language | English | |
| dc.language.iso | eng | |
| dc.publisher | Colorado State University. Libraries | |
| dc.relation.ispartof | Faculty Publications | |
| dc.rights | ©2007 Elsevier B. V. | |
| dc.rights | Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright. | |
| dc.subject | interferometric lithography | |
| dc.subject | nanopatterning | |
| dc.subject | EUV lasers | |
| dc.subject | table top photolithography | |
| dc.title | Table top nanopatterning with extreme ultraviolet laser illumination | |
| dc.type | Text |
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