Table top nanopatterning with extreme ultraviolet laser illumination
Date
2007
Authors
Attwood, D. T., author
Chao, W., author
Anderson, E. H., author
Iemmi, C., author
Rocca, J. J., author
Menoni, C. S., author
Patel, D., author
Marconi, Mario Carlo, author
Wachulak, P., author
Capeluto, M. G., author
Journal Title
Journal ISSN
Volume Title
Abstract
Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications.
Description
Rights Access
Subject
interferometric lithography
nanopatterning
EUV lasers
table top photolithography