Table top nanopatterning with extreme ultraviolet laser illumination

Attwood, D. T., author; Chao, W., author; Anderson, E. H., author; Iemmi, C., author; Rocca, J. J., author; Menoni, C. S., author; Patel, D., author; Marconi, Mario Carlo, author; Wachulak, P., author; Capeluto, M. G., author; Elsevier B. V., publisher

Table top nanopatterning with extreme ultraviolet laser illumination

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ECEmcm00060.pdf (465.01 KB)

Date

2007

Authors

Attwood, D. T., author

Chao, W., author

Anderson, E. H., author

Iemmi, C., author

Rocca, J. J., author

Menoni, C. S., author

Patel, D., author

Marconi, Mario Carlo, author

Wachulak, P., author

Capeluto, M. G., author

Abstract

Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications.

Subject

interferometric lithography

nanopatterning

EUV lasers

table top photolithography

URI

http://hdl.handle.net/10217/67860

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Table top nanopatterning with extreme ultraviolet laser illumination

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