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Table top nanopatterning with extreme ultraviolet laser illumination

Date

2007

Authors

Attwood, D. T., author
Chao, W., author
Anderson, E. H., author
Iemmi, C., author
Rocca, J. J., author
Menoni, C. S., author
Patel, D., author
Marconi, Mario Carlo, author
Wachulak, P., author
Capeluto, M. G., author

Journal Title

Journal ISSN

Volume Title

Abstract

Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications.

Description

Rights Access

Subject

interferometric lithography
nanopatterning
EUV lasers
table top photolithography

Citation

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