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Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography

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dc.contributor.authorKlosner, M. A., author
dc.contributor.authorSilfvast, W. T., author
dc.contributor.authorBender, H. A., author
dc.contributor.authorRocca, Jorge J., author
dc.contributor.authorOptical Society of America, publisher
dc.date.accessioned2007-01-03T08:10:06Z
dc.date.available2007-01-03T08:10:06Z
dc.date.issued1997
dc.description.abstractWe measured an emission of 6 mJ/pulse at 13.5 nm produced by the Li2+ Lyman-α transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wall plug efficiency of 0.1% was nearly an order of magnitude better than that of a LPP.
dc.format.mediumborn digital
dc.format.mediumarticles
dc.identifier.bibliographicCitationKlosner, M. A., et al., Intense Plasma Discharge Source at 13.5 nm for Extreme-Ultraviolet Lithography, Optics Letters 22, no. 1 (January 1, 1997): 34-36.
dc.identifier.urihttp://hdl.handle.net/10217/67584
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado State University. Libraries
dc.relation.ispartofFaculty Publications
dc.rights©1997 Optical Society of America.
dc.rightsCopyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.
dc.titleIntense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography
dc.typeText

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