Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography
Date
1997
Authors
Klosner, M. A., author
Silfvast, W. T., author
Bender, H. A., author
Rocca, Jorge J., author
Optical Society of America, publisher
Journal Title
Journal ISSN
Volume Title
Abstract
We measured an emission of 6 mJ/pulse at 13.5 nm produced by the Li2+ Lyman-α transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wall plug efficiency of 0.1% was nearly an order of magnitude better than that of a LPP.