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    Determination of XUV optical constants by reflectometry using a high-repetition rate 46.9-nm laser

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    http://hdl.handle.net/10217/67528
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    Abstract
    We report the measurement of the optical constants of Si, GaP, InP, GaAs, GaAsP, and Ir at a wavelength of 46.9nm (26.5 eV). The optical constants were obtained from the measurement of the variation of the reflectivity as a function of angle utilizing, as an illumination source, a discharge pumped 46.9-nm table-top laser operated at a repetition rate of 1 Hz. These measurements constitute the first application of an ultrashort wavelength laser to materials research.
    Author(s)
    Vinogradov, A. V.; Uspenskii, Yu. A.; Forsythe, M.; Rocca, Jorge J.; Benware, B. R.; Artioukov, I. A.

    Date Issued
    1999
    Format
    born digital; articles
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    • Faculty Publications - Department of Electrical and Computer Engineering

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