Repository logo

Department of Electrical and Computer Engineering

Permanent URI for this community

https://hdl.handle.net/10217/100411
These digital collections include faculty/student publications, theses, dissertations, and datasets from the Department of Electrical and Computer Engineering. Due to departmental name changes, materials from the following historical department are also included here: Electrical Engineering.

Browse

Browsing Department of Electrical and Computer Engineering by Subject "ablation"

Now showing 1 - 1 of 1
  • Thumbnail Image
    ItemOpen Access
    XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses
    (Colorado State University. Libraries, 2005) Vaschenko, G. O., author; Grisham, M. E., author; Menoni, C. S., author; Rocca, Jorge, J., author; Ryc, L., author; Feldhaus, J., author; Boody, F. P., author; Sobierajski, R., author; Pelka, J. B., author; Andrejczuk, A., author; Krzywinski, J., author; Stupka, M., author; Rus, B., author; Präg, A. R., author; Polan, J., author; Kozlova, M., author; Otcenasek, Z., author; Krasa, J., author; Letal, V., author; Chvostova, D., author; Bittner, M., author; Juha, L., author; Elsevier B. V., publisher
    For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, etch (ablation) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various very short-wavelength (λ < 100 nm) lasers, emitting pulses with durations ranging from ∼10 fs to ∼1 ns, have recently been placed into routine operation. This has facilitated the investigation of how ablation characteristics depend on the pulse duration in the XUV spectral region. Ablation of poly(methyl methacrylate) (PMMA) induced by three particular short-wavelength lasers emitting pulses of various durations, is reported in this contribution.