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Low temperature epitaxial silicon film growth using high vacuum electron-cyclotron-resonance plasma deposition

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dc.contributor.authorChumanov, George, author
dc.contributor.authorDalal, Vikram L., author
dc.contributor.authorDeBoer, Scott J., author
dc.contributor.authorBartels, Randy, author
dc.date.accessioned2007-01-03T04:26:58Z
dc.date.available2007-01-03T04:26:58Z
dc.date.issued1995
dc.description.abstractWe report on the growth technique and electrical properties of epitaxial Si films grown at low temperatures using an electron-cyclotron-resonance plasma deposition technique. We have used standard high vacuum apparatus to grow high quality films at 450-525 °C. A critical step in achieving high quality films is an in situ hydrogen plasma cleaning of the wafer before growth. We have systematically studied the influence of ion bombardment during growth by biasing the substrate, and find that the films are crystalline for substrate bias voltages less negative than about -15 V, but become polycrystalline as the magnitude of the negative bias is increased. The crystallinity of the film was measured using Raman spectroscopy. The undoped films are n type with carrier concentrations in the 1016-1017 cm-3 range. The Hall mobilities measured for the films are comparable to values obtained in bulk Si crystals. We can achieve abrupt profiles in carrier concentrations between the heavy doped substrate and the epilayer, with no evidence of diffusion.
dc.description.sponsorshipThis work was supported in part by a fellowship from the Catron foundation for Scott DeBoer, and in part by a grant from NREL.
dc.format.mediumborn digital
dc.format.mediumarticles
dc.identifier.bibliographicCitationDeBoer, Scott J., et al., Low Temperature Epitaxial Silicon Film Growth Using High Vacuum Electron-Cyclotron-Resonance Plasma Deposition, Applied Physics Letters 66, no. 19 (8 May 1995): 2528-2530.
dc.identifier.urihttp://hdl.handle.net/10217/756
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado State University. Libraries
dc.relation.ispartofFaculty Publications
dc.rights©1995 American Institute of Physics.
dc.rightsCopyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.
dc.subjectcrystal doping
dc.subjectchemical vapor deposition
dc.subjectECR heating
dc.subjectplasma
dc.subjectepitaxy
dc.subjectsilicon
dc.subjectsurface cleaning
dc.subjectcarrier density
dc.subjectcarrier mobility
dc.subject.lcshHall effect
dc.titleLow temperature epitaxial silicon film growth using high vacuum electron-cyclotron-resonance plasma deposition
dc.typeText

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