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The development of a thin film sputter deposition system using a novel hidden anode ion source and motion control

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dc.contributor.authorVanGemert, Jack J., author
dc.contributor.authorWilliams, John D., advisor
dc.contributor.authorFarnell, Casey, committee member
dc.contributor.authorMenoni, Carmen, committee member
dc.contributor.authorWilson, Jesse, committee member
dc.date.accessioned2020-06-22T11:52:55Z
dc.date.available2020-06-22T11:52:55Z
dc.date.issued2020
dc.description.abstractThin films consist of metallic or dielectric materials that are commonly deposited onto surfaces where properties, intrinsic to the thin film, are desired. Ranging from a single atomic layer to several microns in thickness, thin films are found to be useful for a broad range of applications. Most thin film applications desire uniform, durable, and adherent coatings with specific optical, electrical, or tribological properties. Therefore it is important that deposition systems can produce thin films with properties suited for the application at hand. The development of a thin film sputter deposition system is presented. The system has been shown to produce large area art pieces at a low cost compared to current deposition systems. The deposition system uses a novel hidden anode ion source (HAIS) to sputter target material, assist film growth, and to clean substrates prior to deposition. To the author's knowledge, an ion source of this design has not been implemented in a deposition system prior to the one discussed. The characterization of a novel ion source is presented in detail along with the other system components. Deposition rates and thin film profiles are used to validate experimental results and predict thin film properties for various operating conditions. Coatings produced by the system are studied and used to determine film characteristics of interest to the application of outdoor art. Structural thin film properties of interest for long outdoor lifetime art work include film adhesion, density, and residual stress. Visual thin film properties important for the artwork are related to optical properties such as reflection, transmission, and absorption. The plasma-based deposition system is shown to be a tool of high potential for creating engaging, long lifetime art pieces.
dc.format.mediumborn digital
dc.format.mediummasters theses
dc.identifierVanGemert_colostate_0053N_16020.pdf
dc.identifier.urihttps://hdl.handle.net/10217/208487
dc.languageEnglish
dc.language.isoeng
dc.publisherColorado State University. Libraries
dc.relation.ispartof2020-
dc.rightsCopyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.
dc.subjectengineering
dc.subjection source
dc.subjectthin film
dc.subjecthidden anode
dc.subjectart
dc.subjectsputter deposition
dc.titleThe development of a thin film sputter deposition system using a novel hidden anode ion source and motion control
dc.typeText
dcterms.rights.dplaThis Item is protected by copyright and/or related rights (https://rightsstatements.org/vocab/InC/1.0/). You are free to use this Item in any way that is permitted by the copyright and related rights legislation that applies to your use. For other uses you need to obtain permission from the rights-holder(s).
thesis.degree.disciplineMechanical Engineering
thesis.degree.grantorColorado State University
thesis.degree.levelMasters
thesis.degree.nameMaster of Science (M.S.)

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