Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses

Artioukov, I. A., author; Vinogradov, A. V., author; Kondratenko, V. V., author; Sevryukova, V. A., author; Voronov, D. L., author; Zubarev, E. N., author; Pershyn, Yu. P., author; Rocca, Jorge J., author; Menoni, C. S., author; Vaschenko, G., author; Grisham, M., author; Optical Society of America, publisher

Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses

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ECEjjr00181.pdf (1.88 MB)

Date

2004

Authors

Artioukov, I. A., author

Vinogradov, A. V., author

Kondratenko, V. V., author

Sevryukova, V. A., author

Voronov, D. L., author

Zubarev, E. N., author

Pershyn, Yu. P., author

Rocca, Jorge J., author

Menoni, C. S., author

Vaschenko, G., author

Abstract

The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of ~0.08 J/cm2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications.

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http://hdl.handle.net/10217/67841

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Damage to extreme-ultraviolet Sc/Si multilayer mirrors exposed to intense 46.9-nm laser pulses

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