Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography
Date
2007
Authors
Rocca, Jorge J., author
Menoni, C. S., author
Marconi, M. C., author
Capeluto, M. G., author
Wachulak, P. W., author
Optical Society of America, publisher
Journal Title
Journal ISSN
Volume Title
Abstract
Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact tabletop set up.