Coherent EUV lithography with table-top laser
This dissertation describes alternative techniques of optical lithography in the extreme ultraviolet (EUV) region of the electromagnetic spectrum. The pursuit of the Moore's law forces the semiconductor industry to transfer to shorter wavelengths of illumination in projection lithography. The EUV light is perhaps the most viable candidate for the next generation integrated circuits printing. However, the EUV lithography encounters many challenges associated with the very nature of the light it is using. Many novel techniques and materials are being applied at the same time in the lithography ...
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