Scatter loss and surface roughness of hafnium oxide thin films
The work presented in the thesis aims to characterize and improve the surface quality and scatter loss of HfO2 single layer thin films. Dual ion beam sputtered coatings of HfO2 produced at CSU have been shown to have a high damage threshold and low absorption. They have not been optimized for reduced surface roughness. Both surface quality and scattering of dual ion beam sputtered thin films depend on the growth conditions and substrate quality, so a study of growth parameters and substrate choice is conducted. The growth parameters selected in this work are beam voltage of the main ion source ...
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