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    Patterning of nano-scale arrays by table-top extreme ultraviolet laser interferometric lithography

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    http://hdl.handle.net/10217/67583
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    ECEjjr00091.pdf (194.3Kb)
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    Abstract
    Arrays of nanodots were directly patterned by interferometric lithography using a bright table-top 46.9 nm laser. Multiple exposures with a Lloyd's mirror interferometer allowed to print arrays of 60 nm FWHM features. This laser-based extreme ultraviolet interferometric technique makes possible to print different nanoscale patterns using a compact tabletop set up.
    Author(s)
    Rocca, Jorge J.; Menoni, C. S.; Marconi, M. C.; Capeluto, M. G.; Wachulak, P. W.

    Date Issued
    2007
    Format
    born digital; articles
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    • Faculty Publications - Department of Electrical and Computer Engineering

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