Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser
Date
2006
Authors
Rocca, Jorge J., author
Menoni, Carmen S., author
Parkinson, Bruce Alan, author
Lu, Yunfeng, author
Pietrasanta, L., author
Ludueña, S., author
Marconi, Mario Carlos, author
Grisham, Michael Eric, author
Vaschenko, Georgiy O., author
Capeluto, Maria G., author
Journal Title
Journal ISSN
Volume Title
Abstract
We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.
Description
Rights Access
Subject
nanotechnology
photolithography
x-ray lasers
x-ray lithography