Characterization of laser-produced plasmas as light sources for extreme ultraviolet lithography and beyond
Lithography is a critical process in the fabrication of integrated circuits. The continuous increase in computing power for more than half a century has depended in the ability to print smaller and smaller features, which has required the use of light sources operating at increasingly shorter wavelengths. There is keen interest in the development of high-power light sources for extreme ultraviolet (EUV) lithography at λ=13.5 nm and future beyond extreme ultraviolet (BEUV) lithography near λ=6.7 nm. The work conducted in this dissertation has characterized aspects of laser-produced plasmas (LPPs) ...
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