Vaschenko, G. O., authorGrisham, M. E., authorMenoni, C. S., authorRocca, Jorge, J., authorRyc, L., authorFeldhaus, J., authorBoody, F. P., authorSobierajski, R., authorPelka, J. B., authorAndrejczuk, A., authorKrzywinski, J., authorStupka, M., authorRus, B., authorPräg, A. R., authorPolan, J., authorKozlova, M., authorOtcenasek, Z., authorKrasa, J., authorLetal, V., authorChvostova, D., authorBittner, M., authorJuha, L., authorElsevier B. V., publisher2007-01-032007-01-032005Juha, L., et al., XUV-Laser Induced Ablation of PMMA with Nano-, Pico-, and Femtosecond Pulses, Journal of Electron Spectroscopy and Related Phenomena 144-147 (June 2005): [929]-932.http://hdl.handle.net/10217/67843For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, etch (ablation) rates, and the quality of ablated structures often differ dramatically between short (typically nanosecond) and ultrashort (typically femtosecond) pulses. Various very short-wavelength (λ < 100 nm) lasers, emitting pulses with durations ranging from ∼10 fs to ∼1 ns, have recently been placed into routine operation. This has facilitated the investigation of how ablation characteristics depend on the pulse duration in the XUV spectral region. Ablation of poly(methyl methacrylate) (PMMA) induced by three particular short-wavelength lasers emitting pulses of various durations, is reported in this contribution.born digitalarticleseng©2005 Elsevier B. V.Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.wavelength effectsPMMApoly(methyl methacrylate)pulse duration effectsablationsoft X-ray lasersXUV lasersText