Marconi, Mario C., authorFilevich, Jorge, authorRocca, Jorge J., authorShlyaptsev, Vyacheslav N., authorHunter, James R., authorNilsen, Joseph, authorDunn, James, authorSmith, Raymond F., authorOptical Society of America, publisher2007-01-032007-01-032003Smith, Raymond F., et al., Refraction Effects on X-Ray and Ultraviolet Interferometric Probing of Laser-Produced Plasmas, Journal of the Optical Society of America. B, Optical Physics 20, no. 1 (January 2003): 254-259.http://hdl.handle.net/10217/67613We present a study detailing the effects of refraction on the analysis and interpretation of line-of-site optical probe characterization techniques within laser-produced plasmas. Results using x-ray laser backlit grid deflectometry and ray-tracing simulations illustrate the extent to which refraction can be a limiting factor in diagnosing high-density, short-scale-length plasmas. Analysis is applied to a recent experiment in which soft x-ray interferometry was used to measure the electron density within a fast-evolving Al plasma. Comparisons are drawn between extreme ultraviolet and ultraviolet probe wavelengths.born digitalarticleseng©2003 Optical Society of America.Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.Text