Attwood, D. T., authorChao, W., authorAnderson, E. H., authorIemmi, C., authorRocca, J. J., authorMenoni, C. S., authorPatel, D., authorMarconi, Mario Carlo, authorWachulak, P., authorCapeluto, M. G., authorElsevier B. V., publisher2007-01-032007-01-032007Capeluto, M. G., et al., Table Top Nanopatterning with Extreme Ultraviolet Laser Illumination, Microelectronic Engineering 84, no. 5-8 (May-August 2007): [721]-724.http://hdl.handle.net/10217/67860Patterning with extreme ultraviolet light generated by a compact, bright laser source operating at a wavelength of 46.9 nm is demonstrated using two complementary approaches: multiple beam interferometric lithography and de-magnifying projection. Features with sizes ranging from 370 nm to 60 nm were printed in a few seconds in poly-methyl methacrylate resist. These proof-of-principle experiments demonstrate practical table-top nanopatterning tools based on extreme ultraviolet lasers for nanotechnology applications.born digitalarticleseng©2007 Elsevier B. V.Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.interferometric lithographynanopatterningEUV laserstable top photolithographyText