Klosner, M. A., authorSilfvast, W. T., authorBender, H. A., authorRocca, Jorge J., authorOptical Society of America, publisher2007-01-032007-01-031997Klosner, M. A., et al., Intense Plasma Discharge Source at 13.5 nm for Extreme-Ultraviolet Lithography, Optics Letters 22, no. 1 (January 1, 1997): 34-36.http://hdl.handle.net/10217/67584We measured an emission of 6 mJ/pulse at 13.5 nm produced by the Li2+ Lyman-α transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wall plug efficiency of 0.1% was nearly an order of magnitude better than that of a LPP.born digitalarticleseng©1997 Optical Society of America.Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.Text