Van Haesendonck, Chris, authorTemst, Kristiaan, authorVan Bael, Margriet, authorBecker, James P., authorLangouche, Guido, authorMahan, John E., authorVantomme, André, authorAmerican Institute of Physics, publisher2007-01-032007-01-031997Vantomme, André, et al., Thin Film Growth of Semiconducting Mg2Si by Codeposition, Applied Physics Letters 70, no. 9 (3 March 1997): 1086-1088.http://hdl.handle.net/10217/67926Ultrahigh vacuum evaporation of magnesium onto a hot silicon substrate (⩾200 °C), with the intention of forming a Mg2Si thin film by reaction, does not result in any accumulation of magnesium or its silicide. On the other hand, codeposition of magnesium with silicon at 200 °C, using a magnesium-rich flux ratio, gives a stoichiometric Mg2Si film which can be grown several hundreds of nm thick. The number of magnesium atoms which condense is equal to twice the number of silicon atoms which were deposited; all the silicon condenses while the excess magnesium in the flux desorbs. The Mg2Si layers thus obtained are polycrystalline with a (111) texture. From the surface roughness analysis, a self-affine growth mode with a roughness exponent equal to 1 is deduced.born digitalarticleseng©1997 American Institute of Physics.Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.Text