Caolo, Mary Ann, authorHiraoka, Hiroyuki, authorCollins, George J., authorYu, Zengqi, authorKrishnaswamy, Jayaram, authorLi, Lumin, authorIEEE, publisher2007-01-032007-01-031990Li, Lumin, et al., Lithographic Processing of Polymers Using Plasma-Generated Electron Beams, IEEE Transactions on Plasma Science 18, no. 2 (April 1990): 198-209.http://hdl.handle.net/10217/628Pattern definition in polymer films is achieved using electron beams generated in soft vacuum (0.05-0.50 torr) glow discharges either on a continuous or pulsed (20-100 ns) basis. With the continuous- mode electron beam, 7- µm transmission mask features are replicated in both polymethyl methacrylate (PMMA) and polyimide resists. Using a pulsed electron-beam submicron (~0.5 µm) features are transferred from an electron-transmitting stencil mask into the PMMA. The soft-vacuum pulsed electron beam is also eminently suited for polymer stabilization. Pulsed electron-beam hardening of 0.05-3.5- µm-thick AZ-type and MacDermid resist patterns is also demonstrated with hardened resist patterns stable to temperatures between 200° and 350°C. The demonstrated replication and pattern stabilization technique may be applicable in microelectronics packaging lithography where the resist thickness is substantial, linewidths are 1-10 µm, and registration requirements are less stringent.born digitalarticleseng©1990 IEEE.Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.electron beam lithographyplasma applicationspolymer filmsText