Rocca, Jorge J., authorMenoni, Carmen S., authorParkinson, Bruce Alan, authorLu, Yunfeng, authorPietrasanta, L., authorLudueña, S., authorMarconi, Mario Carlos, authorGrisham, Michael Eric, authorVaschenko, Georgiy O., authorCapeluto, Maria G., authorIEEE, publisher2007-01-032007-01-032006Capeluto, Maria G., et al., Nanopatterning with Interferometric Lithography Using a Compact λ = 46:9-nm Laser, IEEE Transactions on Nanotechnology 5, no. 1 (January 2006): 3-7.http://hdl.handle.net/10217/2128We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl methacrylate using a Lloyd's mirror interferometer. This first demonstration of nanopatterning using an extreme ultraviolet (EUV) laser illustrates the potential of compact EUV lasers in nanotechnology applications.born digitalarticleseng©2006 IEEE.Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.nanotechnologyphotolithographyx-ray lasersx-ray lithographyText