Artioukov, I. A., authorVinogradov, A. V., authorKondratenko, V. V., authorSevryukova, V. A., authorVoronov, D. L., authorZubarev, E. N., authorPershyn, Yu. P., authorRocca, Jorge J., authorMenoni, C. S., authorVaschenko, G., authorGrisham, M., authorOptical Society of America, publisher2007-01-032007-01-032004Grisham, M., et al., Damage to Extreme-Ultraviolet Sc/Si Multilayer Mirrors Exposed to Intense 46.9-nm Laser Pulses, Optics Letters 29, no. 6 (March 15, 2004): 620-622.http://hdl.handle.net/10217/67841The damage threshold and damage mechanism of extreme-ultraviolet Sc/Si multilayer mirror coatings are investigated with focused nanosecond pulses at 46.9-nm radiation from a compact capillary-discharge laser. Damage threshold fluences of ~0.08 J/cm2 are measured for coatings deposited on both borosilicate glass and Si substrates. The use of scanning and transmission electron microscopy and small-angle x-ray diffraction techniques reveals the thermal nature of the damage mechanism. The results are relevant to the use of newly developed high-flux extreme-ultraviolet sources in applications.born digitalarticleseng©2004 Optical Society of America.Copyright and other restrictions may apply. User is responsible for compliance with all applicable laws. For information about copyright law, please see https://libguides.colostate.edu/copyright.Text