Plasma processing for nanostructured topographies
Date
2012
Authors
Riedel, Nicholas Alfred, author
Williams, John, advisor
Popat, Ketul, advisor
Radford, Donald, committee member
Reynolds, Melissa, committee member
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Abstract
Plasma and directed ion interactions with materials have been widely observed to create complex surface patterns on a micro- and nano- scale. Generally, these texturizations are byproducts of another intended application (such as a feature formation on a sputtering target) and patterning is considered inconsequential or even detrimental. This work examined the possibility of using these phenomena as primary methods for producing beneficial topographies. Specifically, investigations focused on the use of helium plasma exposure and directed ion etching to create nanostructured surfaces capable of affecting biological interactions with implanted materials. Orthogonal argon ion etching and low energy helium plasma texturization of titanium were considered for use on orthopedic and dental implants as a means of increasing osteoblast activity and bone attachment; and oblique angle etching was evaluated for its use in creating topographies with cell deterrent or anti-thrombogenic properties. In addition, the helium driven evolution of surface features on 6061 aluminum alloy was characterized with respect to ion energy and substrate temperature. These surfaces were then considered for ice phobic applications.
Description
Rights Access
Subject
helium
ion
nano
plasma
texturization
topography