• X-ray characterization of oriented β-tantalum films 

        Author(s):Birzuela, Fernando; Menoni, Carmen S.; Dummer, Ann M.; Dorhout, Peter K.; Rithner, Christopher D.; McCurdy, Patrick R.; Kohli, Sandeep
        Date Issued:2004
        Format:born digital; articles
        Tantalum (Ta) metal films (10-70 nm) were deposited on a Si(100) substrate with a 500 nm silicon dioxide (SiO2) interlayer by ion-beam assisted sputtering. The as-deposited films have been characterized by X-ray diffraction ...