• Nanopatterning with interferometric lithography using a compact λ = 46.9-nm laser 

        Contributor:Rocca, Jorge, J.; Menoni, Carmen S.; Parkinson, Bruce Alan; Lu, Yunfeng; Pietrasanta, L.; Ludueña, S.; Marconi, Mario Carlos; Grisham, Michael Eric; Vaschenko, Georgiy O.; Capeluto, Maria G.
        We report the imprinting of nanometer-scale gratings by interferometric lithography at λ = 46.9 nm using an Ne-like Ar capillary discharge laser. Gratings with periods as small as 55 nm were imprinted on poly-methyl ...