• Ablation of organic polymers by 46.9-nm-laser radiation 

        Author(s):Rocca, Jorge J.; Menoni, C. S.; Vaschenko, G.; Grisham, M. E.; Wawro, A.; Pelka, J. B.; Krzywinski, J.; Pientka, Z.; Ullschmied, J.; Präg, A. R.; Otcenasek, Z.; Krasa, J.; Chvostova, D.; Bittner, M.; Juha, L.
        Date Issued:2005
        Format:born digital; articles
        We report results of the exposure of poly(tetrafluoroethylene) -(PTFE), poly(methyl methacrylate)-(PMMA), and polyimide -(PI) to intense 46.9-nm-laser pulses of 1.2-ns-duration at fluences ranging from ~0.1 to ~10 J/cm2. ...
      • XUV-laser induced ablation of PMMA with nano-, pico-, and femtosecond pulses 

        Author(s):Vaschenko, G. O.; Grisham, M. E.; Menoni, C. S.; Rocca, Jorge, J.; Ryc, L.; Feldhaus, J.; Boody, F. P.; Sobierajski, R.; Pelka, J. B.; Andrejczuk, A.; Krzywinski, J.; Stupka, M.; Rus, B.; Präg, A. R.; Polan, J.; Kozlova, M.; Otcenasek, Z.; Krasa, J.; Letal, V.; Chvostova, D.; Bittner, M.; Juha, L.
        Date Issued:2005
        Format:born digital; articles
        For conventional wavelength (UV-vis-IR) lasers delivering radiation energy to the surface of materials, ablation thresholds, etch (ablation) rates, and the quality of ablated structures often differ dramatically between ...