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(Colorado State University. Libraries, 1994) Robinson, G. Y., author; Hafich, M. J., author; Chilla, J. L. A., author; Rocca, Jorge J., author; Menoni, C. S., author; Martinez, O. E., author; Prasad, M., author; [TMS], publisher
The ambipolar diffusion coefficient and carrier recombination lifetime in InGaP/InAlP multiple quantum wells and InGaP epitaxial layers grown by gas source molecular beam epitaxy have been determined by measuring the diffraction efficiency decay of transient gratings induced by picosecond laser pulses. The multiple quantum well room temperature ambipolar diffusion coefficient of carrier transport parallel to the growth plane was measured to be approximately half that of the bulk material.
